SOURCES AND Components

Sources for Material Deposition

SVTA offers a variety of sources to provide streams of vaporized materials for thin film epitaxy and deposition in an ultra high vacuum (UHV) environment.

High vacuum probe assembly for semiconductor deposition equipment

Effusion Cells

Effusion cells provide a reliable vapor flux from common elements in liquid or solid form.

Ultra high vacuum chamber assembly for thin film deposition systems

Valved and Cracking Sources

Valved sources offer enhanced flux control for more materials that tend to be more problematic, such as Arsenic or Selenium. Cracking sources offer the ability to decompose large source molecules into smaller species through high temperature catalysts.

Precision vacuum feedthrough for semiconductor wafer processing equipment

Electron Beam Evaporators

Electron beam evaporators are used to generate material streams from very low vapor pressure materials and compounds through high energy electron impact.

Glass vacuum tube component for thin film deposition systems

Gas Injectors

Gas injectors allow the controlled introduction of gaseous vapors into the UHV environment.

Stainless steel vacuum chamber component for semiconductor equipment

RF Plasma

RF plasma sources generate monatomic or activated species through a plasma generated from a gas flow.

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Whether you are a researcher, professor, scientist, or student performing R&D in thin film materials, or a business that manufactures high-power laser diode arrays, we will take care of you! Contact us with your questions and needs.