SVT Associates offers Atomic Layer Deposition (ALD) systems as versatile research deposition tools for thermal or energy enhanced ALD. With up to 8 precursor lines, a hot wall and cross flow deposition, a wide range of applications may be performed from a single system. Sample introduction is rapid and convenient with a quick hatch or the optional load lock. The NorthStar ALD system can be interfaced with other deposition and metrology tools. Integration of in-situ metrology tools and the RoboALD software/system automation increases process reproducibility. SVTA is your source for cost effective atomic layer deposition equipment.

NorthStar ALD Systems

Thermal ALD

Atomic layer deposition systems utilizing common gaseous oxidizers, such as water vapor

Heated effusion cell source inside ultra high vacuum deposition chamber

Plasma-Enhanced ALD

Plasmas offer the option for providing active species in the ALD process, such as for oxygen- and nitrogen-containing films

Thin film deposition system cabinet with integrated vacuum chamber

UHV ALD

ALD processes can be performed in an ultrahigh vacuum environment for the highest purity depositions

Atomic Layer Deposition System Applications:

  • High-k Dielectrics
  • Nanocoatings
  • Surface Modification Layers
  • Corrosion protection layers
  • Moisture barrier layers
  • Device Encapsulations
  • MEMS
  • Photonic Crystals

Atomic Layer Deposition Equipment Options:

  • Load Lock for rapid sample exchange
  • Plasma Component
  • Ozone Delivery System
  • Residual Gas Analysis — QMS
  • Quartz Crystal Deposition Monitor
  • In-Situ Ellipsometry
  • Transfer to UHV deposition systems

Technical Documentation:

Contact SVTA for more information.

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Whether you are a researcher, professor, scientist, or student performing R&D in thin film materials, or a business that manufactures high-power laser diode arrays, we will take care of you! Contact us with your questions and needs.